Luthi, R. and Meyer, E. and Bammerlin, M. and Baratoff, A. and Howald, L. and Gerber, C. and Guntherodt, H. J.. (1997) Ultrahigh vacuum atomic force microscopy : true atomic resolution. Surface review and letters, Vol. 4, H. 5. pp. 1025-1029.
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Official URL: http://edoc.unibas.ch/dok/A5839465
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Abstract
In this note we report the first observation of salient features of the Si(111)(7 x 7) reconstructed surface across monatomic steps by dynamic atomic force microscopy (AFM) in ultrahigh vacuum (UHV). Simultaneous measurements of the resonance frequency shift Delta f of the Si cantilever and of the mean tunneling current (I) over bar(t) from the cleaned Si tip indicate a restricted range for stable imaging with true atomic resolution. The corresponding characteristics vs. distance reveal why feedback control via Delta f is problematic, whereas it is as successful as in conventional STM via (I) over bar(t). Furthermore, local dissipation (energy loss of 10(-14) W) through individual atoms is observed and explained by the coupling of the surface atoms to phonons.
| Faculties and Departments: | 05 Faculty of Science > Departement Physik > Physik > Nanomechanik (Meyer) |
|---|---|
| UniBasel Contributors: | Meyer, Ernst |
| Item Type: | Article, refereed |
| Article Subtype: | Research Article |
| Publisher: | World Scient. Publ. |
| Note: | Publication type according to Uni Basel Research Database: Journal article |
| Identification Number: |
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| Last Modified: | 14 Sep 2012 07:18 |
| Deposited On: | 14 Sep 2012 06:43 |
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