Thodkar, K. and Schönenberger, C. and Calame, M. and Lüönd, F. and Overney, F. and Jeanneret, B.. (2016) Characterization of HMDS treated CVD graphene. In: 2016 Conference on Precision Electromagnetic Measurements (CPEM 2016).
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Abstract
Chemical Vapor Deposition (CVD) is a choice growth technique to mass produce graphene over large areas. Residues from transfer processes involving polymeric supporting membranes however lead to unwanted doping and affect the quality of the graphene film. Using Raman spectroscopy it is shown that a Hexamethyldisilazane (HMDS) surface treatment leads to improved electrical properties. Chemical Vapor Deposition (CVD) is a choicegrowth technique to mass produce graphene over large areas.Residues from transfer processes involving polymeric supportingmembranes however lead to unwanted doping and affect thequality of the graphene film. Using Raman spectroscopy it is shown that a Hexamethyldisilazane (HMDS) surface treatmentleads to improved electrical properties.
| Faculties and Departments: | 05 Faculty of Science > Departement Physik > Physik > Experimentalphysik Nanoelektronik (Schönenberger) |
|---|---|
| UniBasel Contributors: | Thodkar, Kishan and Schönenberger, Christian and Calame, Michel |
| Item Type: | Conference or Workshop Item, refereed |
| Conference or workshop item Subtype: | Conference Paper |
| Publisher: | IEEE |
| e-ISBN: | 978-1-4673-9134-4 |
| e-ISSN: | 2160-0171 |
| Note: | Publication type according to Uni Basel Research Database: Conference paper |
| Identification Number: | |
| Last Modified: | 15 Mar 2017 10:50 |
| Deposited On: | 15 Mar 2017 10:50 |
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